company news about Ultrasonic Spray Technology for Solar Cell Coating

Ultrasonic Spray Technology for Solar Cell Coating

Ultrasonic spray technology is used in both photovoltaic crystalline silicon (c-Si) and thin film applications. Ultrasonic spray technology when compared to chemical vapor technology (CVD), sputtering, spin coating, roll coating and fog coating techniques can be a more cost effective means of depositing thin film coatings onto solar cells. Due to the high uniformity of atomized droplets and their low velocity during the coating process, highly uniform, micron thick layers can be formed on c-Si and thin solar film cells. Added benefits of minimal waste or overspray can also lead to significant material savings.

Ultrasonic spray technology is used with the following chemistries:

Dopants, Absorbers, Buffers, Organics, Etc.

Boric acid dopants

Cadmium chloride (CdTe) absorbers

Cadmium sulfide (CdS) – buffer layer used in CIGS, CdTe cells

Copper indium gallium selenide (CIGS or CIS) absorbers

Copper zinc tin sulfide (CZTS) absorbers

Dye sensitized organic solar cells (DSC, DSSC or DYSC)

P3HT

PEDOT

PCBM

Phosphoric acid based dopants in emitter formation

Quantum Dots (QD)

Ultrasonic Spray of has successfully been used to spray a variety of Quantum Dots. Both ZnO films and CdS Quantum Dots have been prepared using ultrasonic spray pyrolysis deposition techniques at a fraction of the cost of CVD and sputtering methods.

Transparent Conductive Oxides (TCO)

Tin dioxide (SnO2)

Indium tin oxide (ITO)

Zinc oxide (ZnO) as nanowires in DSC applications

Carbon nanotubes (CNT)

Silver Nanowires (AGNW)

Graphene

Anti-Reflection (AR) Coatings

SiO2

TiO2

Microspray International can provide from R&D scale solutions to production equipment for solar cell coating.

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